Säntis 300 全晶圆定量阴极发光CL-SEM系统

名称：Säntis 300 全晶圆定量阴极发光CL-SEM系统

The Säntis 300 system has been designed for fully automated control of 150, 200 and 300 mm wafers.
Attolight’s Quantitative CL-SEMs offer “No Compromise” large field fast scanning simultaneous acquisition of SEM image, hyperspectral CL maps, and optical spectra. Smaller diameter wafers, or miscellaneously shaped substrates are manually loaded on intermediary 300 mm susceptors subsequently handled automatically by the tool.

The Säntis 300 system offers 3 distinct acquisition modes : step and repeat (S & R), continuous scanning mode (AWpix), integrative scanning mode (FWbrush)：

– Up to 300 mm wafer tool
– High CL-SEM throughput
– Simultaneous SEM imaging and Optical signature acquisition
– Edge detection for accurate blank wafer positioning (± 5 µ)
– Automated wafer bow mapping and correction

应用领域：

1、Microstructured LEDs (MicroLed)——Step and Repeat and AWPix modes

2、LED——Full wafer brush mode

3、GaN on Sapphire wafer——Threading dislocations density

4、SiC substrate——Defect inspection & classification

5、GaN HEMT——Step & Repeat mode, cross-section